Sulfuric Acid (H₂SO₄) – Electronic Grade

Electronic Grade Sulfuric Acid is widely used in semiconductor fabs for wafer cleaning and organic residue removal during various lithography and deposition stages.

Key Details:
• Chemical Formula: H₂SO₄
• Molecular Weight: 98.08 g/mol
• CAS Number: 7664-93-9
• Appearance: Clear, colorless liquid
• Purity: ≥99.999% (5N–9N Electronic Grade)
• Boiling Point: 337°C

Applications:
• Wafer cleaning to remove organics (Piranha etch with H₂O₂)
• Cleaning before lithography and diffusion processes
• Used in strip/clean cycles in semiconductor fabs

Safety Note: Strong acid; highly corrosive. Use acid-resistant PPE and store in corrosion-resistant containers.