Electronic
Grade Hydrogen Peroxide is used with sulfuric acid and other chemicals as a
strong oxidizing agent for wafer cleaning, surface preparation, and particle
removal.
Key
Details:
• Chemical Formula: H₂O₂
• Molecular Weight: 34.01 g/mol
• CAS Number: 7722-84-1
• Appearance: Clear, colorless liquid
• Purity: ≥99.999% (5N–9N Electronic Grade)
• Concentration: Typically 30% or 50% for semiconductor use
Applications:
• Piranha cleaning (H₂SO₄ + H₂O₂) for organic impurity removal
• Surface preparation and oxidizing cleans in wafer processing
• Used in RCA cleaning sequences
Safety
Note: Strong oxidizer; avoid contact with organics and contaminants. Store
in vented, UV-protected containers.